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CM-230L
By employing an electromagnetic inductive conductivity measurement method,
the system enables high-precision measurement and real-time display of hydrofluoric
acid (HF) concentration, delivering excellent repeatability and accuracy even in low-concentration ranges.
It is widely applicable not only to HF concentration control in wafer cleaning and etching processes,
but also across a broad range of industrial applications.
| Measurement target | hydrofluoric acid (HF) |
|---|---|
| Measurement principle | Electromagnetic induction conductivity measurement method |
| Measurement range | HF 0~1/2/5/10/20/50%, 0~100/200/500/1000mS/cm |
| Reproducibility | ±2% of Full Scale |
| Responsiveness | 90% response within 5 seconds (under constant temperature conditions) |
HF-960M
As semiconductor manufacturing continues to advance, precise concentration control in
low-concentration regions has become increasingly critical in RCA cleaning processes.
HF-960M utilizes a highly durable sensor to provide high-precision, high-speed response
measurement of
low-concentration hydrofluoric acid (HF), hydrochloric acid (HCl),
and ammonia (NH₃).
| Measurement target |
Hydrofluoric Acid (HF) / Hydrochloric Acid (HCl) / Ammonia (NH₃) | |
|---|---|---|
| Measurement method |
Carbon flow-type conductivity measurement with concentration conversion | |
| Cell integer | About 4/cm | |
| Temperature sensor specifications | Platinum resistance thermometer Pt1000 (at 0 °C), Temperature coefficient 3850 ppm/°C (standard) | |
| Measurement range | HF | 0~5000ppm / 0~1000ppm |
| HCI | 0~5000ppm / 0~1000ppm | |
| NH3 | 0~10000ppm / 0~2000ppm | |
| Conductivity | 0~50.00mS/cm, 0~2.000mS/cm | |
| Temperature | 0~100℃ | |
| Repeatability | ±0.5% of Full Scale | |
| linearity | ±0.5% of Full Scale | |
If you want to pruchase and have any questions please feel free to contact +82-31-781-0033 or email.