CS-620F Series
본문
Next-Generation Concentration Monitor Optimized
for High-Temperature Phosphoric Acid Processes
In 3D NAND manufacturing processes, multiple SiO₂ and SiN layers are deposited,
after which high-temperature phosphoric acid (H₃PO₄) is used to selectively
remove the SiN layers.
The CS-620F enables stable, real-time monitoring of concentration and temperature
even at temperatures up to 180 °C, allowing precise control of target etch rates for
each process step.
• Accurate measurement of high-concentration H₃PO₄ up to 92%
• Direct, real-time measurement of phosphoric acid at temperatures up to 180 °C
• All wetted parts made of PFA piping, ensuring excellent corrosion resistance
and process stability
• Concentration output at approximately 3-second intervals for fast feedback control
• Stable measurement performance with minimized influence from
bubbles and vibration
If you want to pruchase and have any questions please feel free to contact +82-31-781-0033 or email.
E-Mail : swkim@ktsemi.co.kr