This is a concentration monitor that measures
various chemical solutions with high precision. The CS-100 Series is a concentration monitor designed for high-precision measurement of various chemical solutions used in semiconductor cleaning and etching processes.
With its fast response and compact design, it enables real-time monitoring of individual chemical concentrations and provides alarm outputs to accurately control the timing of chemical replacement or automatic chemical adding. Its short measurement cycle ensures reliable response to rapid concentration changes.
• Real-time concentration tracking performance   With an approximately 3-second measurement cycle, the system enables precise
  concentration control in 300 mm processes, supporting fine and stable concentration
  management in both multi-bath and one-bath cleaning systems..
• Easy operation with full automatic measurement   Measurement is performed in full automatic mode, requiring no control after measurement
  start. Users only need to supply the chemical solution for measurement to proceed
  automatically. In addition, air is used for reference spectrum measurement, eliminating
  the need for utility water during routine operation.
• Continuous measurement with bubble elimination   An integrated degassing function removes bubbles immediately before the flow
  cell, enabling stable continuous measurement while chemicals are flowing.
• High safety with DC 24 V power supply   The system operates on low-voltage DC 24 V (approx. 45 W), enhancing electrical safety
  and reducing power consumption. A built-in leak sensor enables emergency actions, such as
  shutting off chemical supply in the event of leakage.
• Lightweight and compact design   Featuring a compact design with a footprint reduced to approximately two-thirds of the
  previous model, the system contributes to space savings in cleaning equipment and,
  due to its lightweight construction, can also be installed inside process equipment.