Auto Scanning System
본문
Model
KASS-5600
Wafer surface etching scan equipment This device, coupled with an ICP-MS, analyzes surface metal contamination by etching and scanning the wafer surface. It is designed to support wafer sizes of 6”, 8”, and 12”.
Specification
| Wafer Size | 6”(150mm), 8”(200mm), 12”(300mm) |
|---|---|
| Dimension | 1,730(W) x 1,850(D) x 1,970(H)mm |
| Weight | Less than 700kg |
| Application | BPD Process |
| Through put | 10 Wafer/hr (Full scan mode) |
| Wafer Size | 6”(150mm), 8”(200mm), 12”(300mm) |
If you want to pruchase and have any questions please feel free to contact +82-31-781-0033 or email.
E-Mail : smlee@ktsemi.co.kr